| Subject: | SiAl Sputtering Target, High Quality, Monolithic, Rotatable, Rotary, Cylindrical, Straight, Dogbone, PVD Coating, Thin Film Deposition, Magnetron SiAl Sputtering Targets Manufacturer And Supplier |
| Message: | SILICON ALUMINUM (SiAl) SPUTTERING TARGET Haohai Silicon Aluminum (SiAl) sputtering target with perfect density, high purity and very fine grain microstructure, smooth surface, no cracks, no chipping, no foreign inclusions and contaminants, mainly sputter to coat SiO2 and Si3N4 thin films, which are extensively used in the automotive and architectural glass industry, conductive, scratch and glare resistant glass and video flat panel display glasses. Haohai Silicon Aluminum (SiAl) Sputtering Targets include Silicon Aluminum (SiAl) rotary sputtering targets Silicon Aluminum (SiAl) Rotatable (Rotary, Cylindrical) Sputtering Target Manufacturing RangeOD (mm)ID (mm)Length (mm)Custom Made80 - 16060 - 125100 - 4000 SpecificationCompositionSiAl (90/10 wt%±1%)Purity3N (99.9%)Density2.2 g/cm3Grain Sizes< 200 micron or on requestFabrication ProcessesPlasma Spraying, MachiningShapeStraight, Dog boneEnd TypesSCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made for SS Backing TubeSurfaceRa 1.6 micronOther Specification✦ Vapor degreased and demagnetized after final machining.✦ ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.✦ High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.✦ Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces. For our Silicon Aluminum (SiAl) sputtering targets ToleranceAcc. to drawings or on request. Impurities Content [ppm]Silicon Aluminum Content [90/10 wt%] SiAlPurity [%]99.9Metallic Impurities [ppm]Ca60Cu38Fe200Ga20Ti20Zn70Non-Metallic Impurities [ppm]O5000N100Guaranteed Density [g/cm3]2.2Grain Size [μm]200 Application✦ Large Area Glass Coating (Low-E)✦ Optical (AR)✦ Flat panel display✦ Conductive url:http://www.pvdtarget.com |
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