| Subject: | TiOx Sputtering Target, High Quality, Rotatable, Straight, Dogbone, Planar, PVD Coating, Thin Film Deposition, Magnetron TiOx Sputtering Targets Manufacturer And Supplier |
| Message: | TITANIUM OXIDE (TiOx) SPUTTERING TARGET Haohai Titanium Oxide (TiOx) sputtering target with perfect density, high purity and very fine grain microstructure, smooth surface, no cracks, no chipping, no foreign inclusions and contaminants, are extensively used in optical glass AR thin film coating and large area glass coating (Low-E) manufacturing in the architectural glass industry.Haohai Titanium Oxide (TiOx) Sputtering Targets include Titanium Oxide (TiOx) rotary sputtering targets.Titanium Oxide (TiOx) Rotatable (Rotary, Cylindrical) Sputtering Target Manufacturing RangeOD (mm)ID (mm)Length (mm)Custom Made80 - 16060 - 125100 - 4000 SpecificationCompositionTiOxPurity99.6%>Density4.0 g/cm3Grain Sizes< 200 micron or on requestFabrication ProcessesPlasma Spraying, MachiningShapeStraight, Dog boneEnd TypesSCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made for SS Backing TubeSurfaceRa 1.6 micron Other Specification✦ Vapor degreased and demagnetized after final machining.✦ ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.✦ High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.✦ Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces. For our Titanium Oxide (TiOx) Rotary sputtering targets ToleranceAcc. to drawings or on request. Impurities Content [wt%]Niobium Oxide Content [wt%] TiOx (xImpurities [ppm]Al2O30.03CaO0.03Cr2O30.09Fe2O30.1MoO3003NbO0.03P2O50.01SiO20.06ZrO20.02Resistivity [ohm.cm] 20℃ |
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