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Metal sputtering targets: Mg, Al, Si, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Y, Zr, Nb, Mo, Ru, Ag, In, Sn, Sb, Te, La, Hf, Ta, W, Re, Au, Gd, Tb, Dy, Yb, Ce, Nb, Sm
Metal alloy sputtering targets: NiFe, NiCr, NiV, TiAl, CoCr, CoFe, CoTaZr, CuGa, CuInGa, CuInGaSn, ZnSn, CuZn, CuNi
Ceramic target: ITO, GZO, AZO, AlO3, NiO, MoOX, BiO2, Cr2O3, WO3, MgO, TiO2, ZrO2, HfO2, Nb2O5, Ta2O5
Evaporation Materials:Ti,Ni,Cu,Al,Ag,V.
Specification:
Density: Hi-density
Purity: 99.9%-99.9995%
Shapes: rings, circular, rectangular, cathode, Custom-made
Size: support any size
Application: flat panel display, glass coating, decoration coating, micro-electronics
Place of Origin: Changsha China (Mainland)
Packaging : Vacuum sealed package inside; Wooden case outside
Free Sample Availability: Yes
Delivery Lead Times: 15-25 DAYS
Payment Terms: T/T, Western Union
Min Quantity: 1 PC
Quality Process Certifications: ISO 9001:2008
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